“Interconnect
Process Extendibility From 90 to 45 nm Node”
Dr. Nobuyoshi Kobayashi; Selete Backend Program Mgr.
Keynote Address - 1 (Tuesday AM)
“Moore’s Law Plus - What Will Be Needed
In Interconnect, Other Than Scaling,
From An Applications Perspective”
Dr. Takayasu Sakurai; University Of Tokyo
Keynote Address 2 (Tuesday AM)
“Interconnect: Challenges to the 2D Paradigm”
Dr. Sitaram Arkalgud; Sematech Director of Interconnect
Keynote Address - 3 (Tuesday AM)
“Silicon IC Technology and Manufacturing Innovations
for the Past and the Next 30 Years”
Dr. Hiroshi Iwai; Tokyo Institute of Technology
Keynote Address - 4 (Tuesday AM)
“Practical Integration of Low-k Dielectrics to 45 nm for
Product Development”
Dr. Takeshi Nogami; Sony / IBM Microelectronics
VMIC Awards Luncheon
(Thursday @ Noon)
"BEOL
Interconnect Integration Challenges for 45 nm and Beyond"
Dr. Devendra Kumar; ASM Corp.
Seminar Luncheon (Monday @ Noon)
This year’s VMIC
includes over 120 Technical Papers
and a Full Day State-of-the-Art Seminar (Monday)