Welcome to the 2005 VMIC Conference

TWENTY SECOND INTERNATIONAL VLSI/ULSI MULTILEVEL INTERCONNECTION
CONFERENCE, STATE-OF-THE-ART SEMINAR AND EXHIBITION

Fremont Marriott
Fremont, California
October 3 - 6, 2005
Hotel Registration


VMIC
(22nd International Conference)
FOR VLSI/ULSI MULTILEVEL
INTERCONNECTION

October 4 - 6, 2005


STATE-OF-THE-ART SEMINAR
October 3, 2005

Registration Information Registration Form
HIGHLIGHTS:

“Interconnect Process Extendibility From 90 to 45 nm Node”
Dr. Nobuyoshi Kobayashi; Selete Backend Program Mgr.
Keynote Address - 1 (Tuesday AM)

“Moore’s Law Plus - What Will Be Needed
In Interconnect, Other Than Scaling,
From An Applications Perspective”
Dr. Takayasu Sakurai; University Of Tokyo
Keynote Address 2 (Tuesday AM)

“Interconnect: Challenges to the 2D Paradigm”
Dr. Sitaram Arkalgud; Sematech Director of Interconnect
Keynote Address - 3 (Tuesday AM)

“Silicon IC Technology and Manufacturing Innovations
for the Past and the Next 30 Years”
Dr. Hiroshi Iwai; Tokyo Institute of Technology
Keynote Address - 4 (Tuesday AM)

“Practical Integration of Low-k Dielectrics to 45 nm for
Product Development”
Dr. Takeshi Nogami; Sony / IBM Microelectronics
VMIC Awards Luncheon (Thursday @ Noon)

"BEOL Interconnect Integration Challenges for 45 nm and Beyond"
Dr. Devendra Kumar; ASM Corp.
Seminar Luncheon (Monday @ Noon)

This year’s VMIC includes over 120 Technical Papers
and a Full Day State-of-the-Art Seminar (Monday)
 

 

 


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