2004 CMP-MIC COMMITTEES

 

EXECUTIVE COMMITTEE

 Rich Baker, RODEL

Peter Burke, LSI LOGIC

Raymond Carey, INTEL

Mike Fury, EKC TECH.

Jose Luis Hernandez, IMEC

Dale Hetherington, SANDIA      

Richard Huang, AMD

Akira Isobe, TOKYO SEIMITSU

Seiichi Kondo, SELETE JAPAN

Mansour Moinpour, INTEL

Takeshi Nishioka, TOSHIBA

Takeshi Nogami, SONY

Yutaka Uda, NIKON JAPAN

Thomas Wade, U. SOUTH FLA.

 

PROGRAM COMMITTEE

Eric Beach, TEXAS INSTRUMENTS

Ralph Brandes, DEGUSSA

Katia Devriendt, IMEC

David Dornfeld, U.C. BERKELEY

Fiona Doyle, U.C. BERKELEY

Janos Farkas, MOTOROLA

Paul Feeney, CABOT MICRO.

Kenneth Foster, DOW CHEMICAL

John Gagliardi, 3 M COMPANY

Tamba Gbondo-Tugbawa, PRAESAGUS

David Hansen NOVELLUS

Matt Healy, ATMI

Stuart Hellring, PPG

Masataka Hoshino, ASET JAPAN

Wei-Yung Hsu, APPLIED MAT’L

Eugene Ivanov, TOSOH SMD

John Janzen, HONEYWELL

Rakesh Kumar, IME SINGAPORE

Scott Lantz, INTEL

William Lee, TSMC

Yuzhuo Li, CLARKSON U.

James Lu, R. P. I.

Jianfeng Luo, U.C. BERKELEY

Mark Merrill, KLA-TENCOR

Endou Nobuhiro, SELETE

Michael Oliver, RODEL

Ara Philipossian, U. ARIZONA

Srini Raghaven, U. ARIZONA

Anantha Sethuraman, FEI CO.

Shoso Shingubara, HIROSHIMA U.

Robert Small, EKC TECH

Laura Stearns, SEAGATE

David Stein, SANDIA NAT’L LAB

Peter Thieme, INFINEON

Guangwei Wu, THOMAS WEST

Jerry Yang, RODEL

Akihiko Yamane, TOKYO SEIMITSU

Tao Zhang, JAZZ SEMI