PLANARIZATION
FOR ULSI
Tuesday, February 18, 2003
Registration Information
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Registration Form
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This year's comprehensive Chemical Mechanical Planarization Short Course consist of a FULL DAYS ACTIVITIES and will address those issues associated with current fundamental developments in advancing ULSI multilevel interconnection towards greater functionality, density and speed. It will include a review and discussion of those CMP primary topical areas which impact today's multilevel interconnection activities as well as project future direction for this critical industry. A distinguished set of lecturers will participate in this CMP SHORT COURSE, which is a MUST for all engineers, managers and technicians working on VLSI/ULSI multilevel interconnection. The registration fee includes coffee breaks, luncheon and a visuals booklet.
YOU ARE HIGHLY ENCOURAGED TO ADVANCE REGISTER EARLY TO GUARANTEE YOUR SEAT AT THIS SHORT COURSE.
I.
INTRODUCTORY
REMARKS (9:00 A.M.)
Short Course Chairman
University of South Florida
Tampa, Florida
Coffee Break (10:00 A.M.)
IV.
SLURRY DESIGN FOR
METALS AND
DIELECTRICS (Including Low-k) (10:15 A.M.)
Dr. Rajiv Sing
University of Florida
Gainesville, Florida
IV.
COPPER SLURRY
DEVELOPMENTS ( 11:00 A.M.)
Dr. Yuzhuo Li
Clarkson University
Potsdam, New York
Short Course Luncheon (12:00 P.M.)
“CURRENT AND FUTURE NEEDS
OF
CHEMICAL MECHANICAL PLANARIZATION”
Paul Feeney
CABOT MICROELECTRONICS CORP.
Aurora, Illinois
VI.
ELECTROCHEMICAL
POLISHING
PROCESS DEVELOPMENT (1:45 P.M.)
Dr. Takeshi Nogami
Sony Corporation
Tokyo, JAPAN
VII.
CHEMICAL-MECHANICAL
PLANARIZATION
INTEGRATION ISSUES (2:30 P.M.)
Dr. Katia Devriendt
IMEC
Leuven, Belgium
Coffee Break ( 3:15 P.M.)
V.
ADVANCES IN CHEMICAL
MECHANICAL
PLANARIZATION METROLOGY (4:00 P.M.)
Dr. Jose Estabil
KLA-Tencor Corp.
San Jose, California
IX.
C.M.P.
FUTURE NEEDS AND NEW APPLICATIONS
(4:15 P.M.)
Dr. Dale Hetherington
Sandia National Labs
Albuquerque, New Mexico
VIII. CLOSING REMARKS (5:00 P.M.)
Short Course registration materials may be picked up at the Registration Desk from 7 - 10 A.M. on Tuesday, February 18, 2003. Additional at-door registrations will be conducted during this time as well.