CHEMICAL-MECHANICAL
PLANARIZATION FOR ULSI MULTILEVEL INTERCONNECTION
- SHORT COURSE -

Tuesday, February 26, 2002

Registration Information Registration Form

http://www.imic.org

This year's comprehensive Chemical Mechanical Planarization Short Course consist of a FULL DAYS ACTIVITIES and will address those issues associated with current fundamental developments in advancing ULSI multilevel interconnection towards greater functionality, density and speed. It will include a review and discussion of those CMP primary topical areas which impact todays multilevel interconnection activities as well as project future direction for this critical industry. A distinguished set of lecturers will participate in this CMP SHORT COURSE, which is a MUST for all engineers, managers and technicians working on VLSI/ULSI multilevel interconnection. The registration fee includes coffee breaks, luncheon and a visuals booklet.

YOU ARE HIGHLY ENCOURAGED TO ADVANCE REGISTER EARLY TO GUARANTEE YOUR SEAT AT THIS SHORT COURSE.

TOPICAL COVERAGE

  • I. INTRODUCTORY REMARKS

    Dr. Thomas E. Wade
    Short Course Chairman
    University of South Florida
    Tampa, Florida

9:00 a.m.
  • II. ADVANCES IN CMP METAL PROCESSES
    Dr. David Stein
    Sandia National Labs
    Albuquerque, New Mexico

9:15 A.M.

Coffee Break - 10:00A.M.

  • IV. COPPER SLURRY DEVELOPMENTS
    Dr. Yuzhuo Li
    Clarkson University
    Potsdam, New York

10:15 A.M.
  • V. APPLICATIONS OF CMP IN MAGNETIC DATA STORAGE FABRICATION
    Dr. Ming Jiang
    Seagate Technology
    Bloomington, Minnesota

11:00 A.M.

Short Course Luncheon 12:00 P.M.

"CAN THE SEMICONDUCTOR EQUIPMENT SUPPLIERS KEEP PACE WITH THE I.T.R.S.: AN OUTLOOK INTO NEW AND INNOVATIVE TECHNOLOGIES"

Dr. Maximilian A. Biberger
President & COO
SUPERCRITICAL SYSTEMS, INC.
Gilbert, Arizona

  • VI. MODELING AND SIMULATION ADVANCES IN CMP PROCESSES
    Dr. Tamba Tugbawa
    Massachusetts Inst. of Technology
    Cambridge, Massachusetts

1:45 P.M.
  • VII. CHEMICAL-MECHANICAL PLANARIZATION INTEGRATION ISSUES
    Dr. Katia Devriendt
    IMEC
    Leuven, Belgium

2:30 P.M.
Coffee Break - 3:15 P.M.

  • V. ADVANCES IN CHEMICAL MECHANICAL PLANARIZATION METROLOGY
    Anantha Sethurama
    KLA-Tencor Corp.
    San Jose, California

4:00 P.M.
  • IX. C.M.P. FUTURE NEEDS AND NEW APPLICATIONS
    Dr. Dale Hetherington
    Sandia National Labs
    Albuquerque, New Mexico

4:15 P.M.
  • VIII. CLOSING REMARKS
5:00 P.M.

Short Course registration materials may be picked up at the Registration Desk from 7 - 10 A.M. on Tuesday, February 26, 2002. Additional at-door registrations will be conducted during this time as well.