Due to the importance that advance Chemical-Mechanical-Planariza-tion processes have in modern day multilevel interconnection, we are offering this one-day short course for our attendees. The registration fee includes coffee breaks, luncheon and a visuals booklet.

THIS COURSE HAS LIMITED ENROLLMENT, ADVANCE REGISTER EARLY.

TOPICAL COVERAGE

• I. INTRODUCTORY REMARKS - 9:30 A.M.
  Thomas Wade

• II. METAL CMP PROCESSES - 9:45 A.M.
  Rodney Kistler
  Lam Research Corp., Fremont, CA
  

• Coffee Break - 10:45 A.M.
  

• III. DIELECTRIC CMP PROCESSES - 11:00 A.M.
  Paul Feeney
  Cabot Corp.; Aurora, Illinois

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• Luncheon 12:00 P.M.,
  "CRITICAL ANALYSIS AND MANUFACTURABILITY OF ADVANCED INTERCONNECTS"

  Dr. John H. Givens
  ADVANCED TECHNOLOGY GROUP,
  San Antonio, Texas

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• IV. ADVANCES IN CMP CONSUMABLES - 1:45 P.M.
  Maria Peterson
  EKC Technology; Hayward, CA

• V. ADVANCES IN CMP METROLOGY - 2:45 P.M.
  Anantha Sethurama
  KLA - Tencor Corp; San Jose, CA

• Coffee Break - 3:45 P.M.

• VI. MODELING AND SIMULATION OF CMP PROCESSES - 4:00 P.M. Bin Zhao
  Conexant Systems; Newport Beach, CA

• VII. CLOSING REMARKS - 5:00 P.M.

Short course registration materials may be picked up at the Registration Desk from 7 - 9:30 AM, Mon., June 26, 2000.

Additional registrations - on a space available basis - will be conducted during this time also. Come early to avoid lines.