Chemical - Mechanical
PLANARIZATION FOR ULSI MULTILEVEL INTERCONNECTION

- SHORT COURSE -

Wednesday, March 1, 2000

Registration and Information

This year's Chemical Mechanical Planarization Short Course consist of a FULL DAYS ACTIVITIES and will address those issues associated with current fundamental developments in advancing ULSI multilevel interconnection towards greater functionality, density and speed.

It will include a review and discussion of those CMP primary topical areas which impact todays multilevel interconnection activities as well as project future direction for this critical industry. A distinguished set of lecturers will participate in this CMP SHORT COURSE, which is a MUST for all engineers, managers and technicians working on VLSI/ULSI multilevel interconnection.

The registration fee includes coffee breaks, luncheon and a visuals booklet.

THIS COURSE HAS LIMITED ENROLLMENT. YOU ARE HIGHLY ENCOURAGED TO ADVANCE REGISTER EARLY.

TOPICAL COVERAGE

  1. 8:35 A.M. - INTRODUCTORY REMARKS
    Thomas E. Wade
    Short Course Chairman
    University of South Florida
    Tampa, Florida

  2. 8:45 A.M. - ADVANCE IN CHEMICAL-MECHANICAL PLANARIZATION CONSUMABLES
    Kathleen Perry
    Obsidian, Inc.
    Fremont, California

  3. 9:30 A.M. - DEVELOPMENTS IN CMP DIELECTRIC PROCESSES
    Paul Feeney
    Cabot Corp.
    Aurora, Illinois

    -----Coffee Break 10:15 A.M------.

  4. 10:30 A.M. - DEVELOPMENTS IN CMP META PROCESSES
    Rod Kistler
    Lam Research Corp.
    Fremont, California

  5. 11:15 A.M. - ADVANCES IN CHEMICAL MECHANICAL PLANARIZATION METROLOGY
    Jose Estabil & Anantha Sethurama
    KLA-Tencor Corp.
    San Jose, California

    12:00 P.M. - Short Course Luncheon

    "CHEMICAL MECHANICAL POLISH: THE MONKEY ON YOUR BACK"
    Dr. Karey Holland
    TECHCET CORPORATION
    Pheonix, Arizona

  6. 01:45 P.M. - MODELING AND SIMULATION ADVANCES IN CMP PROCESSES
    Duane Boning
    Massachusetts Inst.of Technology
    Cambridge, Massachusetts

  7. 02:30 P.M. - CHEMICAL MECHANICAL PLANARIZATION INTEGRATION ISSUES
    Katia Devriendt
    IMEC
    Leuven, Belgium

    -------Coffee Break 3:15 P.M.---------

  8. 03:30 P.M.- CHEMICAL MECHANICAL PLANARIZATIO EQUIPMENT
    MARKET OVERVIEW AND NEEDS
    Michael Fury
    Silterra Sdn. Bhd.
    Kulim, Malaysia

  9. 04:15 P.M.- C.M.P. FUTURE NEEDS AND NEW APPLICATIONS
    Dale Hetherington
    Sandia National Labs
    Albuquerque, New Mexico

  10. 05:00 P.M. - CLOSING REMARKS

Short Course registration materials may be picked up at the Registration Desk from 7 - 10 A.M. on Wed., March 1, 2000.

Additional registration - on a space available basis - will be conducted during this time as well.